{"id":37791,"date":"2024-07-02T12:13:14","date_gmt":"2024-07-02T19:13:14","guid":{"rendered":"https:\/\/inside.ewu.edu\/mcnair\/?page_id=37791"},"modified":"2025-11-06T13:22:31","modified_gmt":"2025-11-06T21:22:31","slug":"chris-abruscato","status":"publish","type":"page","link":"https:\/\/inside.ewu.edu\/mcnair\/chris-abruscato\/","title":{"rendered":"Chris Abruscato"},"content":{"rendered":"
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Chris Abruscato<\/h1>\n\n\n
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Chris Abruscato<\/strong> is a senior at Eastern Washington University (EWU), set to graduate in Spring 2026 with a\u00a0BS in Physics. He is a member of the Honor\u2019s Society, a Ronald E. McNair Scholar, and the current president of EWU\u2019s Physics Club. During Summer 2025, he participated in University of Nebraska – Lincoln\u2019s research symposium, where he won 1st place in the REU \u201cEmerging Quantum Materials and Technology\u201d for his poster presentation.\u00a0His research interests are unique quantum phenomena and the philosophical implications of various physical models, including but not limited to the Many-Worlds Interpretation of quantum mechanics. Chris plans to join the private sector immediately after graduation to\u00a0support his family and get more hands-on experience. Once fulfilled, he will attend graduate school with the goal of earning a PhD in theoretical physics.<\/p>\n\n<\/div>\n<\/div>\n\n

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2025 Research Mentor:<\/strong> Dr. Xiaoshan Xu<\/a> at University of Nebraska \u2013 Lincoln (UNL)<\/p>\n\n\n\n

Quest to break the memory wall<\/strong><\/p>\n\n\n\n

Abstract:<\/strong> For many years, efforts have been made to develop and implement information storage devices that utilize ferroelectricity. This is particularly important given the increasing demands of computer storage. To this end, the University of Nebraska Lincoln\u2019s Ferro Thin Films Lab has studied the ferroelectric properties of dopedhafnium oxide (HfO2, aka \u201chafnia\u201d) thin films grown by pulsed laser deposition (PLD). To support this research, a model equation was derived that predicts thin film thickness, as a function of number of pulsed laser shots and O2 background pressure, using experimental data obtained from UNL\u2019s Ferro Thin Films Lab. A program was coded using this model equation to assist with future research predictions and design.
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